Singulus upgrades wet-chemical etch/clean to IPA-free

SINGULUS TECHNOLOGIES modified its SILEX wet-chemical batch silicon cleaning and etch system, introducing an Isopropanol (IPA)-free texturing process for mono-crystalline silicon solar cell fab.

August 3, 2011 — SINGULUS TECHNOLOGIES modified its SILEX wet-chemical batch silicon cleaning and etch system, introducing an Isopropanol (IPA)-free texturing process. The system processes mono-crystalline silicon solar cells at reportedly lower costs, in less time, and with longer etch solution lifetimes.

SINGULUS STANGL SOLAR (SINGULUS STANGL), the company’s subsidiary, developed the texturing process to avoid flammable, volatile solvents such as IPA, using commercialized additives to acheive a stable wafer processing step. The alkaline texturing process also increases etch solution lifetime by 3x, and etch times are shortened. The new SILEX systems achieves an output of up to 3,000 wafer per hour (WPH) and produces less than 0.05% scrap rates.

The system acheives silicon cell surface quality to meet photovoltaics manufacturers’ demands. With a wafer thickness of around 150µm, the new SINGULUS STANGL plant meets the mass production requirements. SINGULUS installed the first new-generation SILEX at a large Asian customer, where it successfully passed the final acceptance test (FAT).

SINGULUS makes equipment for solar and optical disc manufacturers. Learn more at www.singulus.de.

Also read: SINGULUS thin film solar cell tool cleans rear and sides in 1 step

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