SEMI’s PV Group has formed committees in Japan and Taiwan to come up with standards on thin-film substrates and crystalline silicon (c-Si) cells and tools.
September 21, 2009 – SEMI’s PV Group has formed committees in Japan and Taiwan to come up with standards on thin-film substrates and crystalline silicon (c-Si) cells and tools.
In Japan, initial work will focus on standardizing dimensions of thin-film substrates. This regional committee, which will work with other SEMI PV technical committees, will explore and develop standards pertaining to criteria, guidelines, methods for control and comparison of PV-related areas including process/metrology equipment, materials, components, and manufacturing operations — with the goal to increase product/process yield and reduce cost/Watt peak.
In Taiwan, the PV Group’s work started in 2008 with the formation of a standards working group; 30 meetings later this group involves “key players” throughout the PV manufacturing chain — materials, equipment, wafers, cells, modules, and thin films — as well as academia, research institutes, and industry associations. Leaders represent Chroma, DelSolar, UL Taiwan, and ITRI. The Taiwan PV standards group is currently developing standards for c-Si cell appearance and a vibration test method.
SEMI’s PV Group has identified 64 topics as “applicable,” with nearly half (31) rated a “top priority” with the impact to “deliver immediate cost benefits to the industry with limited revision.” One passed earlier this summer, for instance, was a unified equipment communication interface (#PV2-0709); earlier this year they approved a test method to detect elemental impurities in photovoltaic silicon feedstock (#PV1-0309).