Tokyo, Japan [RenewableEnergyWorld.com] Tokyo Electron (TEL) and Sharp Corporation have announced that the two companies have entered into a joint venture for photovoltaic (PV) cell production.
The joint venture between TEL and Sharp is expected to result in the development of high-productivity plasma CVD systems for use in thin-film silicon PV cell production. The systems will be developed by combining TEL’s experience with vacuum plasma technology for semiconductor and FPD production equipment businesses, with the thin-film silicon PV cell production technology that Sharp has works with.
The development of the equipment will be financed by both TEL and Sharp. The manufacturing and sales of the equipment will be conducted solely by TEL. The first shipments are currently planned for 2009.